Zirconium Sputtering Targets, High Quality Cylindrical Targets, Thin Film Deposition, Monolithic, Column, Rotary, Planar, Cathodic ARC, PVD Coating

Product Detail

Zirconium Sputtering Target, High Quality, Monolithic, Column, Rotary, Cylindrical, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron Zr Sputtering Targets Manufacturer and Vendor




ZIRCONIUM (Zr) SPUTTERING TARGET




As well as titanium products, zirconium is a main products of Haohai, we focus on zirconium materials and its application for a long time. Haohai zirconium sputtering target and arc cathodes are well known and extensively used in PVD coating field because of the high purity, fine grain sizes, homogeneous microstructure, excellent surface condition and accurate dimensions.




Haohai zirconium sputtering target include ziconium monolithic rotary sputtering target, zirconium planar sputtering target and arc cathodic target.

 

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Zirconium Monolithic Rotary (Rotatable, Cylindrical) Sputtering Target

 

Manufacturing Range

OD (mm)	ID (mm)	Length (mm)	Custom Made
50 - 300	30 - 280	100 - 4000

 

Specification

Composition	Zr
Purity	R60702, 3N (99.9%), 3N5 (99.95%), 4N (99.99%)
Density	6.50 g/cm3
Grain Sizes	< 80 micron or on request
Fabrication Processes	Vacuum Melting, Forging, Extruding, Machining
Shape	Straight, Dog bone
End Types	SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove, Custom Made
Surface	Ra 1.6 micron




Other Specification

? Vapor degreased and demagnetized after final machining

? ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.

? High vacuum tight, leak rate at any location not to exceed 1 x 10^-8 STD CC/SEC.

? Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces

 

Normal Sizes

Zirconium Rotary  Sputtering Target

Normal Sizes

55mm ID x   70mm OD x 1334mm Long   80mm ID x 100mm OD x                Long 125mm ID x 153mm OD x   576mm Long 125mm ID x 153mm OD x   800mm Long 125mm ID x 153mm OD x   895mm Long 125mm ID x 155mm OD x   895mm Long 125mm ID x 153mm OD x 1172mm Long 125mm ID x 153mm OD x 1676mm Long 125mm ID x 153mm OD x 1940mm Long 125mm ID x 153mm OD x 1994mm Long 125mm ID x 153mm OD x 2420mm Long 125mm ID x 153mm OD x 3191mm Long 125mm ID x 153mm OD x 3852mm Long 125mm ID x 153mm OD x                Long 125mm ID x 180mm OD x   624mm Long 194mm ID x 219mm OD x 2301mm Long




Compared to planar configurations, Haohai cylindrical sputtering target offer:

? Larger erosion zones that provide 2 to 2.5 times the material utilization

? Longer target life that reduces the frequency of downtime for changeouts and chamber maintenance

? Custom manufacturing in monolithic, segmented or thermal spray formats

? End features that are precision machined for individual cathode system designs

? Reduce the cost of ownership for large area coating operations

? Variety of materials including

? Optimum grain size and uniform microstructure assure consistent process performance through full end of life

? Complete homogeneity and high purity levels produce consistent coverage

? Able to supply materials to any size operation from R&D to full-scale production

 




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Zirconium Planar (rectangle, circular) Sputtering Target




Manufacturing Range

Rectangle	Length (mm)	Width (mm)	Thickness (mm)	Custom Made
	10 - 2000	10 - 1200	1.0 - 50.8
Circular	Diameter (mm)		Thickness (mm)
	10 - 1000		1.0  - 100

 

Specification

Composition	Zr
Purity	R60702, 3N (99.9%), 3.5N (99.95%), 4N (99.99%), 4.5N (99.995%)
Density	6.50 g/cm3
Grain Sizes	< 80 micron or on request
Fabrication Processes	Vacuum melting, Forging, rolling, Machining
Shape	Plate, Disc, Step, Custom Made
Types	Monolithic, Multi-Segmented Target
Surface	Ra 1.6 micron

 

Other Specifications

Rectangle targets

Rolled plates, per ASTM B551

For rectangle targets, we cut big plates into sizes by water jet, to make sure the composition, mechanical properties and the grain structure of every part in the same batch is homogeneous and consistent. We can supply the layout of the master plate, our customer can trace the position of every part by our marking system.

 

Circular targets

Rolled bars, per ASTM B550

For the circular targets, we cut long bars into sizes by wire-electrode cutting, to make sure the composition, mechanical properties and the grain structure of every part in the same batch is homogeneous and consistent, we can supply the layout of the master bar, our customer can trace the position of every part by our marking system.

 

We make sure the same grain direction in the multi-segmented construction parts.

Flatness, clean surface, polished, free of crack, oil, dot, etc.




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Zirconium Arc Cathodes

We supply rotary and planar arc cathodes as well as rotary and planar sputtering targets




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For our Zirconium Sputtering Target and Arc Cathodes




Tolerance 

Acc. to drawings or on request.




Impurities Content (wt%/ppm)

Zirconium Content [wt%]		Zr 702 (wt%)	Zr (ppm)
Purity [%]		99.2	99.95
Metallic Impurities [µg/g]	Zr+Hf	99.2	-
	Hf	4.5	-
	Fe+Cr	0.2	-
	Sn	-	16
	Nb	-	0.03
	Al	-	48
	Si	-	35
	Ti	-	35
	Cr	-	3.5
	Fe	-	50
	Ni	-	4
	Mo	-	4
	Pd	-	5
	U	-	1
Non-Metallic Impurities [µg/g]	S	-	15
	N	0.025	30
	C	0.05	50
	O	0.16	100
Guaranteed Density [g/cm3]		6.51	6.51
Grain Size [µm]		100	100
Thermal Conductivity [W/(m·K)]		22.7	22.7
Coefficient of Thermal Expansion [1/K]		5.8·10-6	5.8·10-6

Concentrations of other metal elements are too low to be determined.




Application

? Large Area Glass Coating (Low-E, Automotive)

? Wear Resistant Coating

? Decorative Coating

? Optical Coating

 

Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets and arc cathodes. Our zirconium sputtering target, with high purity, include monolithic rotary (column, cylindrical) targets, planar (rectangle) targets, and arc cathodes, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality targets.