Titanium sputtering target, high purity, monolithic, rotatable, rotary, cylindrical, planar, cathodic arc, PVD coating, thin film deposition, magnetron Ti sputtering targets manufacturer and supplier

Product Detail

Titanium Sputtering Target, High Purity, Monolithic, Rotatable (rotary, Cylindrical), Planar (rectangle), Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron Ti Sputtering Targets





TITANIUM SPUTTERING TARGET




Haohai Metal as a top class manufacturer for Titanium and Titanium alloys over 18 years, many companies turn to Haohai for Titanium and Titanium alloys because they consider us the most reliable vendor they trust to provide high quality titanium products that meet or exceed their specifications.


 

Haohai Sputtering Targets as the target materials division (TMD) of Haohai Metal, with a modern, well equipped plant and invaluable knowledge about titanium material, options and applications, we provides specialty metal(especially titanium) thin film PVD materials in a wide variety of sputtering target configurations according to client's requirements. Material properties and forms are optimized for individual chamber types and deposition processes.




Our in-house material synthesis and manufacturing operations enable us to provide market-leading value in sputtering targets.




Haohai titanium sputtering targets include titanium monolithic rotary sputtering targets, planar sputtering targets and cathodic targets.




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Titanium Monolithic Rotatable (Rotary, Cylindrical) Sputtering Target

 

Manufacturing Range

OD (mm)	ID (mm)	Length (mm)	Custom Made
50 - 300	30 - 280	100 - 4000

 

Specification

Composition	Ti
Purity	CP Grade 2 (99.5%), CP Grade 1 (99.7%),                                                                3N5 (99.95%), 4N (99.99%), 4N5 (99.995%)
Density	4.51 g/cm3
Grain Sizes	< 80 micron or on request
Fabrication Processes	Vacuum Melting, Forging, Extruding, Machining
Shape	Straight, Dog Bone
End Types	SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove, Custom Made
Surface	Ra 1.6 Micron or on request

 

Other Specification

? Vapor degreased and demagnetized after final machining.

? ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.

? High vacuum tight, leak rate at any location not to exceed 1 x 10^-8 STD CC/SEC.

? Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces.

 




Normal Sizes

Titanium Rotary  Sputtering Target	Normal Sizes	Backing Tubes
	55mm ID x   70mm OD x 1334mm Long   80mm ID x 100mm OD x                Long 125mm ID x 153mm OD x   576mm Long 125mm ID x 153mm OD x   800mm Long 125mm ID x 153mm OD x   895mm Long 125mm ID x 155mm OD x   895mm Long 125mm ID x 153mm OD x 1172mm Long 125mm ID x 153mm OD x 1676mm Long 125mm ID x 153mm OD x 1940mm Long 125mm ID x 153mm OD x 1994mm Long 125mm ID x 153mm OD x 2420mm Long 125mm ID x 153mm OD x 3191mm Long 125mm ID x 153mm OD x 3852mm Long 125mm ID x 153mm OD x                Long 125mm ID x 180mm OD x   624mm Long 194mm ID x 219mm OD x 2301mm Long	80mm ID x   88.0mm OD x                   Long 125mm ID x 133.0mm OD x 1940.0mm Long 125mm ID x 132.5mm OD x 3200.4mm Long 125mm ID x 132.5mm OD x                   Long

 

Compared to titanium planar configurations, Haohai titanium cylindrical sputtering targets offer:

? Larger erosion zones that provide 2 to 2.5 times the material utilization.

? Longer target life that reduces the frequency of downtime for changeouts and chamber maintenance.

? Custom manufacturing in monolithic, segmented or thermal spray formats.

? End features that are precision machined for individual cathode system designs.

? Reduce the cost of ownership for large area coating operations.

? Variety of materials including.

? Optimum grain size and uniform microstructure assure consistent process performance through full end of life.

? Complete homogeneity and high purity levels produce consistent coverage.

? Able to supply materials to any size operation from R&D to full-scale production.




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Titanium Planar (Rectangle, Circular) Sputtering Target

 

Haohai standard planar sputtering targets for thin film are available monolithic or bonded with planar target dimensions and configurations up to 2000 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment.




Manufacturing Range

Rectangle	Length (mm)	Width (mm)	Thickness (mm)	Custom Made
	10 - 2000	10 - 1200	1.0 - 50.8
Circular	Diameter (mm)		Thickness (mm)
	10 - 1000		1.0 - 100

 

Specification

Composition	Ti, Ti6Al4V Grade 5
Purity	CP Grade 2 (99.5%),  3N (99.9%), 3.5N (99.95%), 4N (99.99%), 4.5N (99.995%),   5N (99.999%)
Density	4.51 g/cm3
Grain Sizes	< 80 micron or on request
Fabrication Processes	Vacuum Melting, Forging, Rolling, Machining
Shape	Plate, Disc, Step, Down bolting, Threading, Custom Made
Type	Monolithic, Multi-segmented Target, Bongding
Surface	Ra 1.6 micron

 

Other Specifications

Rectangle target

Rolled Plates, per ASTM B265

For rectangle targets, we cut big plates into sizes by water jet, to make sure the composition, mechanical properties and the grain structure of every part in the same batch is homogeneous and consistent. We can supply the layout of the master plate, our customer can trace the position of every part by our marking system.

 

Circular Target

Rolled bars, per ASTM B348

For the circular targets, we cut long bars into sizes by wire-electrode cutting, to make sure the composition, mechanical properties and the grain structure of every part in the same batch is homogeneous and consistent, we can supply the layout of the master bar, our customer can trace the position of every part by our marking system.




We make sure the same grain direction in the multi-segmented construction parts.

Flatness, clean surface, polished, free of crack, oil, dot, etc.




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Titanium Arc Cathodes

We supply rotary and planar arc cathodes as well as rotary and planar sputtering targets




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For Haohai titanium sputtering target and arc cathodes:




Tolerance

Acc. to drawings or on request.




Impurities Content [ppm]

Purity [%]	Elements	Grade 2 [99.5]	Grade 1 [99.7]	3N5 [99.95]	4N5 [99.995]
Metallic Impurities [µg/g]	Ag	-	-	0.4	0.05
	As	-	-	0.5	003
	Al	-	-	0.5	0.1
	Ca	-	-	0.5	0.2
	Cd	-	-	0.8	0.05
	Cr	-	-	0.15	0.05
	Cu	-	-	1.2	0.05
	Fe	3000	2000	10	3
	Mg	-	-	0.6	0.06
	Mn	-	-	0.01	0.06
	Mo	-	-	0.2	0.5
	Sb	-	-	0.5	0.05
	Pb	-	-	0.3	0.01
	Sn	-	-	0.4	0.05
	V	-	-	0.1	0.02
	W	-	-	0.2	0.01
	Zn	-	-	0.3	0.05
	Zr	-	-	0.8	0.05
	Hf	-	-	0.2	0.01
	U	-	-	0.001	0.001
	Ta	-	-	2	1
Non-Metallic Impurities [µg/g]	C	800	800	30	10
	O	2500	1800	80	5
	H	150	150	5	1
	N	300	300	20	5
	S	-	-	1	0.05
Guaranteed Density [g/cm3]		4.5	4.5	4.5	4.5
Grain Size [µm]		60	60	60	60
Thermal Conductivity [W/(m.K)]		max.25	max.25	max.25	max.25
Coefficient of Thermal Expansion [1/K]		10.8-6	10.8-6	10.8-6	10.8-6

 

Application

? Large Area Glass Coating (Low-E, Automotive)

? Display Industry

? Wear Resistant Coating

? Decorative Coating

? Solar & Photovoltaic Industry







Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets and arc cathodes. Our titanium sputtering target, with high purity, include monolithic rotatable (rotary, cylindrical) targets, planar (rectangle) targets, and arc cathodes, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality targets.