Vanadium Sputtering Target, High Purity, Monolithic, Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating, Thin Film Deposition, Magnetron V Sputtering Targets
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China Mainland
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1
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Vanadium Sputtering Target, High Quality, Monolithic, Column, Rotary, Cylindrical, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron V Sputtering Targets Manufacturer and Vendor
VANADIUM SPUTTERING TARGET
Vanadium is a soft and ductile, silver-grey metal. It has good resistance to corrosion by alkalis, sulfuric and hydrochloric acid. It oxidizes readily at about 933 K (660 C). Vanadium has good structural strength and a low fission neutron cross section, making it useful in nuclear applications. Although a metal, it shares with chromium and manganese the property of having valency oxides with acid properties.
Haohai is specializes in producing high purity Vanadium Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, physical vapor deposition (PVD) display and optical applications. Our Vanadium Sputtering Targets for thin film are available monoblock rotary, planar targets or bonded with planar targets with different shapes and dimensions.
Haohai vanadium sputtering targets include vanadium monolithic rotatable sputtering targets, vanadium planar sputtering targets and vanadium cathodic targets.
Vanadium Rotary (Rotatable, Cylindrical) Sputtering Target
Manufacturing Range
OD (mm) | ID (mm) | Length (mm) | Custom Made |
50 - 300 | 30 - 280 | 100 - 4000 |
Specification
Composition | V |
Purity | 2N5 (99.5%), 2N7 (99.7%), 3N (99.9%), 3N5 (99.95%), 4N (99.99%) |
Density | 6.11 g/cm3 |
Grain Sizes | < 80 micron or on request |
Fabrication Processes | Vacuum Melting, forging, extruding, Machining, Bonding |
Shape | Straight, Dog bone |
End Types | SCI, SRF, DSF, RFF, WFF, VA, Beakert, GPI Ends Fixation, Spiral Groove, Custom Made |
Surface | Ra 1.6 micron |
Other Specification
? Vapor degreased and demagnetized after final machining
? ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.
? High vacuum tight, leak rate at any location not to exceed 1 x 10-8 STD CC/SEC.
? Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces
Normal Sizes
Vanadium Rotary Sputtering Target | Normal Sizes |
80mm ID x 100mm OD x Long 125mm ID x 153mm OD x 895mm Long 125mm ID x 153mm OD x 1172mm Long 125mm ID x 153mm OD x 1290mm Long 125mm ID x 153mm OD x 1676mm Long 125mm ID x 153mm OD x 1940mm Long 125mm ID x 153mm OD x 2420mm Long 125mm ID x 153mm OD x 3191mm Long 125mm ID x 153mm OD x 3852mm Long |
Compared to titanium planar configurations, Haohai titanium cylindrical sputtering targets offer:
? Larger erosion zones that provide 2 to 2.5 times the material utilization.
? Longer target life that reduces the frequency of downtime for changeouts and chamber maintenance.
? Custom manufacturing in monolithic, segmented or thermal spray formats.
? End features that are precision machined for individual cathode system designs.
? Reduce the cost of ownership for large area coating operations.
? Variety of materials including.
? Optimum grain size and uniform microstructure assure consistent process performance through full end of life.
? Complete homogeneity and high purity levels produce consistent coverage.
? Able to supply materials to any size operation from R&D to full-scale production.
Vanadium Planar (Rectangle, Circular) Sputtering Target
Manufacturing Range
Rectangle | Length (mm) | Width (mm) | Thickness (mm) | Custom Made |
10 - 2000 | 10 - 600 | 1.0 - 25 | ||
Circular | Diameter (mm) | Thickness (mm) | ||
10 - 400 | 1.0 - 25 |
Specification
Composition | V |
Purity | 2N5 (99.5%), 3N (99.9%), 3.5N (99.95%), 4N (99.99%) |
Density | 6.11 g/cm3 |
Grain Sizes | < 80 micron or on request |
Fabrication Processes | Vacuum Melting, Forging, Rolling, Machining |
Shape | Plate, Disc, Step, Down bolting, Threading, Custom Made |
Type | Monolithic, Multi-segmented Target, Bonding |
Surface | Ra 1.6 micron or on request |
Other Specifications
? We make sure the same grain direction in the multi-segmented construction parts.
? Flatness, clean surface, polished, free of crack, oil, dot, etc.
Vanadium Arc Cathodes
We supply vanadium rotary and planar arc cathodes as well as vanadium rotary and planar sputtering targets
For our Vanadium Sputtering Target and Arc Cathodes
Tolerance
Acc. to drawings or request.
Impurities Content [ppm]
Vanadium Purity [%] | Elements | 2N5 [99.5] | 3N5 [99.95] |
Metallic Impurities [µg/g] | Al | 350 | 50 |
Ca | 200 | 50 | |
Cr | 100 | 50 | |
Cu | 50 | 50 | |
Fe | 800 | 200 | |
Mo | 500 | 130 | |
NI | 300 | 50 | |
Si | 800 | 150 | |
Sn | 100 | 30 | |
Ti | 250 | 150 | |
Non-Metallic Impurities [µg/g] | C | 150 | 50 |
O | 400 | 200 | |
H | 30 | 20 | |
N | 200 | 50 | |
Guaranteed Density [g/cm3] | 6.11 | 6.11 | |
Grain Size [µm] | 80 | 80 | |
Thermal Conductivity [W/(m.K)] | 30.7 | 30.7 | |
Coefficient of thermal expansion [1/K] | 8.4-6 | 8.4-6 |
Analytical Methods:
1. Metallic elements were analyzed using GDMS (Precision and bias typical of GDMS measurements are discussed under ASTM F1593).
2. Gas elements were analyzed using LECO GAS ANALYZER .
? C,S determined by Combustion-lR
? N,H determined by IGF-TC
? O determined by IGF-NDIR
Application
? Large Area Glass Coating
? Electronics industry
? Wear Resistant Coating
? Decorative Coating
Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets and arc cathodes. Our vanadium sputtering target, with high purity, include monolithic rotary (column, cylindrical) targets, planar (rectangle) targets, and arc cathodes, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality targets.
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