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Molybdenum Sputtering Target, High Purity, Monolithic, Rotatable, HIP, Cylindrical, Planar, Custom Made, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron Mo Sputtering Targets Manufacturer and Supplier

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Product Detail

    Molybdenum Sputtering Target, High Purity, Monolithic, Rotatable, HIP, Cylindrical, Planar, Custom Made, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron Mo Sputtering Targets Manufacturer and Supplier



    MOLYBDENUM (Mo) SPUTTRING TARGET


    Molybdenum thin films is one of the most important layers on the thin-film transistors which used in TFT-LCD flat displays, they provide instantaneous control for every individual pixel (screen speed) and consequently ensure particularly sharp image quality (display quality). Haohai Molybdenum sputtering targets and arc cathodes targets are perfectly performance in PVD Coating processes, to create outstanding thin films with particularly functions to satisfy our clients requirements.

     

    Our Molybdenum sputtering targets also widely used in the coating process for CIGS solar cells.

     

    Haohai Molybdenum sputtering targets include Molybdenum rotary sputtering targets, Molybdenum planar sputtering targets and Molybdenum cathodic targets.



     

    Molybdenum Rotatable (Rotary, Cylindrical) Sputtering Target


    Manufacturing Range

    OD (mm)

    ID (mm)

    Length (mm)

    Custom Made

    140 - 300

    125 - 280

    100 - 3300

     

    Specification

    Composition

    Mo (Mo1, Mo2, TZM)

    Purity

    3N5 (99.95%)

    Density

    10.2 g/cm3

    Grain Sizes

    < 100 micron or on request

    Fabrication Processes

    Vacuum Melting, HIP, Plasma Spraying, Machining, Bonding

    Shape

    Straight, Dog bone

    End Types

    SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove, 

    Custom Made for SS Backing Tube

    Surface

    Ra 1.6 micron

     

    Other specification

    ? Vapor degreased and demagnetized after final machining

    ? ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.

    ? High vacuum tight, leak rate at any location not to exceed 1 x 10-8 STD CC/SEC.

    ? Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces

     

    Normal Sizes

    Molybdenum Rotary 

    Sputtering Target


    Normal Sizes


      55mm ID x   70mm OD x 1334mm Long

      80mm ID x 100mm OD x                Long

    125mm ID x 153mm OD x   576mm Long

    125mm ID x 153mm OD x   800mm Long

    125mm ID x 153mm OD x   895mm Long

    125mm ID x 155mm OD x   895mm Long

    125mm ID x 153mm OD x 1172mm Long

    125mm ID x 153mm OD x 1676mm Long

    125mm ID x 153mm OD x 1940mm Long

    125mm ID x 153mm OD x 1994mm Long

    125mm ID x 153mm OD x 2420mm Long

    125mm ID x 153mm OD x 3191mm Long

    125mm ID x 153mm OD x 3852mm Long

    125mm ID x 153mm OD x                Long

    125mm ID x 180mm OD x   624mm Long

    194mm ID x 219mm OD x 2301mm Long


     


      

    Molybdenum Planar (rectangle, circular) Sputtering Target

     

    Manufacturing Range

    Rectangle

    Length (mm)

    Width (mm)

    Thickness (mm)

    Custom Made

    10 - 3000

    10 - 800

    1.0 - 50.8

    Circular

    Diameter (mm)


    Thickness (mm)

    10 - 1000


    1.0 - 100


    Specification

    Composition

    Mo (Mo1, Mo2, TZM)

    Purity

    3N5 (99.95%)

    Density

    10.2 g/cm3

    Grain Sizes

    < 100 micron or on request

    Fabrication Processes

    Vacuum Melting, HIP, Plasma Spraying, Machining, Bonding

    Shape

    Straight, Dog bone

    End Types

    SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove, 

    Custom Made for SS Backing Tube

    Surface

    Ra 1.6 micron

     

    Other Specifications

    Flatness, clean smooth surface, polished, free of crack, oil, dot, etc.

    Excellent conductions, small linear expansion coefficient and good heat-resistance




    Molybdenum arc cathodes

    We supply rotary and planar arc cathodes as well as rotary and planar sputtering targets




    For our Molybdenum Sputtering Target and Arc Cathodes


    Tolerance 

    Acc. to drawings or requirements.

     

    Impurities Content (wt%)

    Purity [%]

    Mo

    99.95

    Metallic Impurities [µg/g]

    Fe

    0.005

    Ni

    0.002

    Al

    0.002

    Si

    0.003

    Ca

    0.002

    Mg

    0.001

    Non-Metallic Impurities [µg/g]

    O

    0.003

    N

    0.001

    C

    0.005

    P

    0.001

    Guaranteed Density [g/cm3]

    10.2

    Grain Size [µm]

    100

     

    Application

    ? Large Area Glass Coating

    ? Display Coating

    ? Wear Resistant Coating

    ? Decorative Coating

    ? Solar & Photovoltaic Industry

     


    Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets and arc cathodes. Our molybdenum sputtering target, with high purity, include monolithic or bonding rotatable (rotary, cylindrical) targets, planar (rectangle, disc) targets, and arc cathodes, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality molybdenum targets.

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Haohai Metal Materials Co., Ltd.

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