Aluminum Sputtering Target, High Purity, Monolithic, Tubular, Rotary, Planar, Step, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron Al Sputtering Targets Manufacturer and Supplier

Product Detail

Aluminum Sputtering Target, High Purity, Monolithic, Tubular, Rotary, Planar, Step, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron Al Sputtering Targets Manufacturer and Supplier




ALUMINIUM SPUTTERING TARGET

 

Haohai aluminum sputtering target and arc cathodes with particularly homogeneous microstructure and outstanding surface quality are mainly used for metallization in thin-film transistors for TFT-LCD monitors, television sets, cell phone displays and CD.

 

Haohai Aluminum Targets include Aluminum rotary sputtering targets, Aluminum planar sputtering targets and Aluminum cathodic targets.

 

---




Aluminum Rotatable (Rotary, Cylindrical) Sputtering Target

 

Manufacturing Range

OD (mm)	ID (mm)	Length (mm)	Custom Made
80 - 250	60 - 230	100 - 4000




Specification

Composition	Al
Purity	3N (99.9%), 3N5 (99.95%), 4N (99.99%), 4N5 (99.995%), 5N (99.999%)
Density	2.7 g/cm3
Grain Sizes	< 100 micron or on request
Fabrication Processes	Vacuum Melting, Machining
Shape	Straight, Dog bone
End Types	SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove,  Custom Made for SS Backing Tube
Surface	Ra 1.6 micron




Other Specification

? Vapor degreased and demagnetized after final machining.

? ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.

? High vacuum tight, leak rate at any location not to exceed 1 x 10-8 STD CC/SEC.

? Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces.

 

---

  

Aluminum Planar (Rectangle, Circular) Sputtering Target

 

Manufacturing Range

Rectangle	Length (mm)	Width (mm)	Thickness (mm)	Custom Made
	10 - 2000	10 - 600	2.0 - 40
Circular	Diameter (mm)		Thickness (mm)
	5.0 - 500		2.0 - 40




Specification

Composition	Al
Purity	3N (99.9%), 3N5 (99.95%), 4N (99.99%), 4N5 (99.995%), 5N (99.999%)
Density	2.7 g/cm3
Grain Sizes	< 100 micron or on request
Fabrication Processes	Vacuum Melting, Machining
Shape	Monolithic, Multi-segmented Target, Bonding
Types	Plate, Disc, Step, Down bolting, Threading, Custom Made
Surface	Ra 1.6 micron




Other Specifications

Flatness, clean smooth surface, polished, free of crack, oil, dot, etc.

Excellent conductions, small linear expansion coefficient and good heat-resistance.

 

---




Aluminum arc cathodes

We supply rotary and planar arc cathodes as well as rotary and planar sputtering targets

 

---




For our Aluminum sputtering targets and arc cathodes

 

Tolerance

Acc. to drawings or on request.

 

Haohai provides Aluminum sputtering targets and arc cathodes continually and improves the following material and coating properties:

? Fine grain size and homogeneous microstructure

? High Ductility

? Outstanding material hardness

? Excellent resistance to oxidation

? Coefficient of friction

? Temperature resistance

? Thermal conductivity

? High electrical conductivity




Impurities Content [ppm] 

Aluminum Content		Al
Purity [%]		99.999
Metallic Impurities [ppm]	Al	Matrix
	Cu	1.3
	Cr	0.145
	Co	0.75
	Fe	2.8
	Mg	1.4
	Mn	0.16
	Ni	0.25
	Si	2.4
Non-Metallic Impurities[ppm]	O	10
	S	0.2
	N	1
	C	10
Guaranteed Density [g/cm3]		2.7
Grain Size [µm]		100
Thermal Conductivity [W/(m·K)]		238




Application

? Display Industry

? Decorative Coating

? Optical Coating

? Solar & Photovoltaic Industry

? Semiconductors










Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets and arc cathodes. Our aluminum sputtering target, with high purity, include monolithic rotatable (rotary, tubular, cylindrical) targets, planar (rectangle, disc) targets, and arc cathodes, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality alumimum targets.