Chromium sputtering target, high purity, monolithic, rotatable, disc, HIP, planar, cathodic ARC, PVD coating, thin film deposition, magnetron Cr sputtering targets manufacturer and supplier

Product Detail

Chromium sputtering target, high purity, monolithic, rotatable, disc, HIP, planar, cathodic ARC, PVD coating, thin film deposition, magnetron Cr sputtering targets manufacturer and supplier







CHROMIUM SPUTTERING TARGET




Haohai offers high density, hot rolled Chromium sputtering targets of electrolytic Chromium refined to a purity up to 99.99% with a low content of oxygen and other gaseous impurities.





Chromium and Chromium Nitride (CrN) made from Haohai's Chromium sputtering targets is an excellent function and decorative coating that provides lubricity and superior wear and corrosion resistance. It has a very low residual stress, which provides for the best adhesion and ductility of any of the PVD coatings even as a bonding layer in DLC coatings (Diamond Like Carbon). It can applicate in automotive parts, molds and dies, pump parts, shafts, dry deep drawing and works especially well when used against copper.

 

Decorative chromium coatings are applied using the magnetron sputtering method.

Wear resistant and adhesive layers can also be produced using the arc evaporation method.

 

Haohai Chromium sputtering targets include Chromium rotary sputtering targets, Chromium planar sputtering targets and Chromium cathodic targets.




---




Chromium Rotary (Rotatable, Cylindrical) Sputtering Target




Manufacturing Range

OD (mm)	ID (mm)	Length (mm)	Custom Made
50 - 300	30 - 280	100 - 4000




Specification

Composition	Cr
Purity	2N5 (99.5%), 2N8 (99.8%), 3N (99.9%), 3N5 (99.95%), 4N (99.99%)
Density	7.19 g/cm3
Grain Sizes	< 100 micron or on request
Fabrication Processes	Vacuum Melting, HIP, Plasma Spraying, Machining, Bonding
Shape	Straight, Dog bone
End Types	SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove,  Custom Made for SS Backing Tube
Surface	Ra 1.6 micron




Other Specification

? Vapor degreased and demagnetized after final machining.

? ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.

? High vacuum tight, leak rate at any location not to exceed 1 x 10^-8 STD CC/SEC.

? Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces.




Normal Sizes

Chromium Rotary  Sputtering Target	Normal Sizes	SS Backing Tubes
	55mm ID x   70mm OD x 1334mm Long   80mm ID x 100mm OD x                Long 125mm ID x 153mm OD x   576mm Long 125mm ID x 153mm OD x   800mm Long 125mm ID x 153mm OD x   895mm Long 125mm ID x 155mm OD x   895mm Long 125mm ID x 153mm OD x 1172mm Long 125mm ID x 153mm OD x 1676mm Long 125mm ID x 153mm OD x 1940mm Long 125mm ID x 153mm OD x 1994mm Long 125mm ID x 153mm OD x 2420mm Long 125mm ID x 153mm OD x 3191mm Long 125mm ID x 153mm OD x 3852mm Long 125mm ID x 153mm OD x                Long 125mm ID x 180mm OD x   624mm Long 194mm ID x 219mm OD x 2301mm Long	80mm ID x   88.0mm OD x                   Long 125mm ID x 133.0mm OD x 1940.0mm Long 125mm ID x 132.5mm OD x 3200.4mm Long 125mm ID x 132.5mm OD x                   Long




---




Chromium Planar (rectangle, circular) Sputtering Target

 

Manufacturing Range

Rectangle	Length (mm)	Width (mm)	Thickness (mm)	Custom Made
	10 - 2000	10 - 1200	1.0 - 50.8
Circular	Diameter (mm)		Thickness (mm)
	10 - 1000		1.0 - 100




Specification

Composition	Cr
Purity	2N5 (99.5%), 2N8 (99.8%), 3N (99.9%), 3.5N (99.95%), 4N (99.99%)
Density	7.19 g/cm3
Grain Sizes	< 100 micron or on request
Fabrication Processes	Vacuum Melting, HIP, Plasma Spraying, Machining, Bonding
Shape	Plate, Disc, Step, Custom Made
Types	Monolithic, Multi-Segmented Target, Bonding
Surface	Ra 1.6 micron




Other Specifications

Flatness, clean surface, polished, free of crack, oil, dot, etc.

We monitor and control from the initial step - choose and mix powder, and then under the follow up process of shaping such as HIP, we make sure that our targets get the specific guaranteed density, purity and homogeneous microstructure, to provide our customer the best conditions to coat excellent thin films.




---




Chromium Arc Cathodes


We supply rotary and planar arc cathodes as well as rotary and planar sputtering targets.




---




For our Chromium Sputtering Target and Arc Cathodes




Tolerance

Acc. to drawings or on request.

 

Impurities Content [ppm]

Purity [%]		99.99	99.95	99.8	99.5
Metallic Impurities [ppm]	Fe	50	200	800	1000
	Si	20	100	500	700
	Other	30	100	400	500
Non-Metallic Impurities [ppm]	O	100	200	1000	1200
	N	20	100	200	200
	C	20	100	300	300
Guaranteed Density [g/cm3]		7.15	7.15	7.12	7.12
Grain Size [µm]		100	100	100	100
Thermal Conductivity [W/(m.K)]		max.260	max.250	max.150	max.100
Coefficient of Thermal Expansion [1/K]		7.10-6	7.10-6	7.10-6	7.10-6




Application

? Large Area Glass Coating (Low-E, Automotive)

? Display Inducstry

? Wear Resistant Coating

? Decorative Coating

? Optical Industry

? Solar & Photovoltaic Industry

? Magnetic Data Storage

 







Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets and arc cathodes. Our chromium sputtering target, with high purity, include monolithic or spayed rotatable (rotary, cylindrical) targets, planar (rectangle, disc) targets, and arc cathodes, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality chromium targets.